Slot: photochemical exposure (photochemical_exposure)

This term is used to describe a chemical reaction caused by absorption of ultraviolet (wavelength from 100 to 400 nm), visible light (400-750 nm), or infrared radiation (750-2500 nm)

URI: basalt_schema:photochemical_exposure Alias: photochemical_exposure

Applicable Classes

Name	Description	Modifies Slot
AerosolSample	An aerosol sample collected from the environment	no
OtherUndescribedSample	A sample that does not fit into any of the other described sample types	no
AerosolArmSample	An aerosol sample collected by the ARM facility	no

Properties

Type and Range

Property	Value
Range	PhotochemicalExposureEnum
Domain Of	AerosolArmSample, AerosolSample, OtherUndescribedSample

Cardinality and Requirements

Property	Value

Identifier and Mapping Information

Schema Source

from schema: https://EMSL-Computing.github.io/BASALT-Schema

Mappings

Mapping Type	Mapped Value
self	basalt_schema:photochemical_exposure
native	basalt_schema:photochemical_exposure

LinkML Source

name: photochemical_exposure
description: This term is used to describe a chemical reaction caused by absorption
  of ultraviolet (wavelength from 100 to 400 nm), visible light (400-750 nm), or infrared
  radiation (750-2500 nm)
title: photochemical exposure
from_schema: https://EMSL-Computing.github.io/BASALT-Schema
rank: 1000
alias: photochemical_exposure
domain_of:
- AerosolArmSample
- AerosolSample
- OtherUndescribedSample
range: PhotochemicalExposureEnum